MBE Components / Systems - UMC
MBE Komponenten has more than 50 years of combined MBE industry experience in the design, fabrication and use of effusion, evaporation, sublimation and gas sources. In addition, a wide range of crucibles and ancillary parts are available or can be produced for standard and modified MBE machines and equipment.
- Effusion Cells
- Valved Sources
- Electron Beam Evaporators
- Dopant Sources
- Gas Sources
- Crucibles
- Power Supplies
- Substrate Manipulators
Effusion Cells
Components for molecular beam epitaxy effusion cells
| Standard Effusion Cell – WEZ | Organic Material Effusion Cell – OME |
|---|---|
| Mini Effusion Cell – MEZ | High Temperature Effusion Cell – HTEZ |
| Production Effusion Cell – PEZ | High Temperature Source – HTS |
| Low Temperature Effusion Cell – NTEZ | Oxygen Resistant Effusion Cell – OREZ |
Valved Sources
| Valved GaP Compound Source – VGCS | Valved Arsenic Cracker Source – VACS |
Electron Beam Evaporators
| Standard E-Beam Evaporator – EBV | Vertical E-Beam Evaporator – EBVV |
|---|---|
| Multi-Pocket E-Beam Evaporator – EBVM | HV Power Supplies for EBV Series |
Dopant Sources
| Silicon Sublimation Source – SUSI | Dual Dopant Source – DCS |
|---|---|
| Carbon Sublimation Source – SUKO |
Dopant Source Sources
| Gallium Phosphide Cubes – 6N Pure | Monocrystalline Silicon – >1000 Ohm/cm |
|---|---|
| Single Crystal, 0.5g | Shaped to fit customer’s crucibles, 2cc – 500cc |
Gas Sources
| Hydrogen Atom Beam Source – HABS | Gas Cracker Cell – GRZ |
|---|---|
| Hydrogen Cracker Source – HCS | Thermal Gas Injector – TGI |
MBE / UHV Systems
| Research MBE Systems | In-Situ Etching Systems – ISES |
Equipment
| Substrate Manipulator – SH | Cross Beam Ionizer – CBI |
|---|---|
| Power Supply, Temperature Control – PS | Shutter Control Unit – SCU |
| Thermocouples – TC | Shutter – S |
| Cables and Connectors – CA | Sof Acting Rotary Shutter Module – RSM |
| Manipulator Control Unit – MCU | Soft Acting Linear Shutter Module – LSM |
| Cryopump Valve Control Unit – CVCU | Magnetic Rotary Feedthrough – MRD |
| Beam Flux Monitor – BFM | Viewport Shutter – FSH |
| Cooling Shroud – CS | Crucibles – CRU |
Valved Sources
Components for molecular beam epitaxy effusion cells
| Standard Effusion Cell – WEZ | Organic Material Effusion Cell – OME |
|---|---|
| Mini Effusion Cell – MEZ | High Temperature Effusion Cell – HTEZ |
| Production Effusion Cell – PEZ | High Temperature Source – HTS |
| Low Temperature Effusion Cell – NTEZ | Oxygen Resistant Effusion Cell – OREZ |
Valved Sources
| Valved GaP Compound Source – VGCS | Valved Arsenic Cracker Source – VACS |
Electron Beam Evaporators
| Standard E-Beam Evaporator – EBV | Vertical E-Beam Evaporator – EBVV |
|---|---|
| Multi-Pocket E-Beam Evaporator – EBVM | HV Power Supplies for EBV Series |
Dopant Sources
| Silicon Sublimation Source – SUSI | Dual Dopant Source – DCS |
|---|---|
| Carbon Sublimation Source – SUKO |
Dopant Source Sources
| Gallium Phosphide Cubes – 6N Pure | Monocrystalline Silicon – >1000 Ohm/cm |
|---|---|
| Single Crystal, 0.5g | Shaped to fit customer’s crucibles, 2cc – 500cc |
Gas Sources
| Hydrogen Atom Beam Source – HABS | Gas Cracker Cell – GRZ |
|---|---|
| Hydrogen Cracker Source – HCS | Thermal Gas Injector – TGI |
MBE / UHV Systems
| Research MBE Systems | In-Situ Etching Systems – ISES |
Equipment
| Substrate Manipulator – SH | Cross Beam Ionizer – CBI |
|---|---|
| Power Supply, Temperature Control – PS | Shutter Control Unit – SCU |
| Thermocouples – TC | Shutter – S |
| Cables and Connectors – CA | Sof Acting Rotary Shutter Module – RSM |
| Manipulator Control Unit – MCU | Soft Acting Linear Shutter Module – LSM |
| Cryopump Valve Control Unit – CVCU | Magnetic Rotary Feedthrough – MRD |
| Beam Flux Monitor – BFM | Viewport Shutter – FSH |
| Cooling Shroud – CS | Crucibles – CRU |
Electron Beam Evaporators
Components for molecular beam epitaxy effusion cells
| Standard Effusion Cell – WEZ | Organic Material Effusion Cell – OME |
|---|---|
| Mini Effusion Cell – MEZ | High Temperature Effusion Cell – HTEZ |
| Production Effusion Cell – PEZ | High Temperature Source – HTS |
| Low Temperature Effusion Cell – NTEZ | Oxygen Resistant Effusion Cell – OREZ |
Valved Sources
| Valved GaP Compound Source – VGCS | Valved Arsenic Cracker Source – VACS |
Electron Beam Evaporators
| Standard E-Beam Evaporator – EBV | Vertical E-Beam Evaporator – EBVV |
|---|---|
| Multi-Pocket E-Beam Evaporator – EBVM | HV Power Supplies for EBV Series |
Dopant Sources
| Silicon Sublimation Source – SUSI | Dual Dopant Source – DCS |
|---|---|
| Carbon Sublimation Source – SUKO |
Dopant Source Sources
| Gallium Phosphide Cubes – 6N Pure | Monocrystalline Silicon – >1000 Ohm/cm |
|---|---|
| Single Crystal, 0.5g | Shaped to fit customer’s crucibles, 2cc – 500cc |
Gas Sources
| Hydrogen Atom Beam Source – HABS | Gas Cracker Cell – GRZ |
|---|---|
| Hydrogen Cracker Source – HCS | Thermal Gas Injector – TGI |
MBE / UHV Systems
| Research MBE Systems | In-Situ Etching Systems – ISES |
Equipment
| Substrate Manipulator – SH | Cross Beam Ionizer – CBI |
|---|---|
| Power Supply, Temperature Control – PS | Shutter Control Unit – SCU |
| Thermocouples – TC | Shutter – S |
| Cables and Connectors – CA | Sof Acting Rotary Shutter Module – RSM |
| Manipulator Control Unit – MCU | Soft Acting Linear Shutter Module – LSM |
| Cryopump Valve Control Unit – CVCU | Magnetic Rotary Feedthrough – MRD |
| Beam Flux Monitor – BFM | Viewport Shutter – FSH |
| Cooling Shroud – CS | Crucibles – CRU |
Dopant Sources
Components for molecular beam epitaxy effusion cells
| Standard Effusion Cell – WEZ | Organic Material Effusion Cell – OME |
|---|---|
| Mini Effusion Cell – MEZ | High Temperature Effusion Cell – HTEZ |
| Production Effusion Cell – PEZ | High Temperature Source – HTS |
| Low Temperature Effusion Cell – NTEZ | Oxygen Resistant Effusion Cell – OREZ |
Valved Sources
| Valved GaP Compound Source – VGCS | Valved Arsenic Cracker Source – VACS |
Electron Beam Evaporators
| Standard E-Beam Evaporator – EBV | Vertical E-Beam Evaporator – EBVV |
|---|---|
| Multi-Pocket E-Beam Evaporator – EBVM | HV Power Supplies for EBV Series |
Dopant Sources
| Silicon Sublimation Source – SUSI | Dual Dopant Source – DCS |
|---|---|
| Carbon Sublimation Source – SUKO |
Dopant Source Sources
| Gallium Phosphide Cubes – 6N Pure | Monocrystalline Silicon – >1000 Ohm/cm |
|---|---|
| Single Crystal, 0.5g | Shaped to fit customer’s crucibles, 2cc – 500cc |
Gas Sources
| Hydrogen Atom Beam Source – HABS | Gas Cracker Cell – GRZ |
|---|---|
| Hydrogen Cracker Source – HCS | Thermal Gas Injector – TGI |
MBE / UHV Systems
| Research MBE Systems | In-Situ Etching Systems – ISES |
Equipment
| Substrate Manipulator – SH | Cross Beam Ionizer – CBI |
|---|---|
| Power Supply, Temperature Control – PS | Shutter Control Unit – SCU |
| Thermocouples – TC | Shutter – S |
| Cables and Connectors – CA | Sof Acting Rotary Shutter Module – RSM |
| Manipulator Control Unit – MCU | Soft Acting Linear Shutter Module – LSM |
| Cryopump Valve Control Unit – CVCU | Magnetic Rotary Feedthrough – MRD |
| Beam Flux Monitor – BFM | Viewport Shutter – FSH |
| Cooling Shroud – CS | Crucibles – CRU |
Gas Sources
Components for molecular beam epitaxy effusion cells
| Standard Effusion Cell – WEZ | Organic Material Effusion Cell – OME |
|---|---|
| Mini Effusion Cell – MEZ | High Temperature Effusion Cell – HTEZ |
| Production Effusion Cell – PEZ | High Temperature Source – HTS |
| Low Temperature Effusion Cell – NTEZ | Oxygen Resistant Effusion Cell – OREZ |
Valved Sources
| Valved GaP Compound Source – VGCS | Valved Arsenic Cracker Source – VACS |
Electron Beam Evaporators
| Standard E-Beam Evaporator – EBV | Vertical E-Beam Evaporator – EBVV |
|---|---|
| Multi-Pocket E-Beam Evaporator – EBVM | HV Power Supplies for EBV Series |
Dopant Sources
| Silicon Sublimation Source – SUSI | Dual Dopant Source – DCS |
|---|---|
| Carbon Sublimation Source – SUKO |
Dopant Source Sources
| Gallium Phosphide Cubes – 6N Pure | Monocrystalline Silicon – >1000 Ohm/cm |
|---|---|
| Single Crystal, 0.5g | Shaped to fit customer’s crucibles, 2cc – 500cc |
Gas Sources
| Hydrogen Atom Beam Source – HABS | Gas Cracker Cell – GRZ |
|---|---|
| Hydrogen Cracker Source – HCS | Thermal Gas Injector – TGI |
MBE / UHV Systems
| Research MBE Systems | In-Situ Etching Systems – ISES |
Equipment
| Substrate Manipulator – SH | Cross Beam Ionizer – CBI |
|---|---|
| Power Supply, Temperature Control – PS | Shutter Control Unit – SCU |
| Thermocouples – TC | Shutter – S |
| Cables and Connectors – CA | Sof Acting Rotary Shutter Module – RSM |
| Manipulator Control Unit – MCU | Soft Acting Linear Shutter Module – LSM |
| Cryopump Valve Control Unit – CVCU | Magnetic Rotary Feedthrough – MRD |
| Beam Flux Monitor – BFM | Viewport Shutter – FSH |
| Cooling Shroud – CS | Crucibles – CRU |
Crucibles
Components for molecular beam epitaxy effusion cells
| Standard Effusion Cell – WEZ | Organic Material Effusion Cell – OME |
|---|---|
| Mini Effusion Cell – MEZ | High Temperature Effusion Cell – HTEZ |
| Production Effusion Cell – PEZ | High Temperature Source – HTS |
| Low Temperature Effusion Cell – NTEZ | Oxygen Resistant Effusion Cell – OREZ |
Valved Sources
| Valved GaP Compound Source – VGCS | Valved Arsenic Cracker Source – VACS |
Electron Beam Evaporators
| Standard E-Beam Evaporator – EBV | Vertical E-Beam Evaporator – EBVV |
|---|---|
| Multi-Pocket E-Beam Evaporator – EBVM | HV Power Supplies for EBV Series |
Dopant Sources
| Silicon Sublimation Source – SUSI | Dual Dopant Source – DCS |
|---|---|
| Carbon Sublimation Source – SUKO |
Dopant Source Sources
| Gallium Phosphide Cubes – 6N Pure | Monocrystalline Silicon – >1000 Ohm/cm |
|---|---|
| Single Crystal, 0.5g | Shaped to fit customer’s crucibles, 2cc – 500cc |
Gas Sources
| Hydrogen Atom Beam Source – HABS | Gas Cracker Cell – GRZ |
|---|---|
| Hydrogen Cracker Source – HCS | Thermal Gas Injector – TGI |
MBE / UHV Systems
| Research MBE Systems | In-Situ Etching Systems – ISES |
Equipment
| Substrate Manipulator – SH | Cross Beam Ionizer – CBI |
|---|---|
| Power Supply, Temperature Control – PS | Shutter Control Unit – SCU |
| Thermocouples – TC | Shutter – S |
| Cables and Connectors – CA | Sof Acting Rotary Shutter Module – RSM |
| Manipulator Control Unit – MCU | Soft Acting Linear Shutter Module – LSM |
| Cryopump Valve Control Unit – CVCU | Magnetic Rotary Feedthrough – MRD |
| Beam Flux Monitor – BFM | Viewport Shutter – FSH |
| Cooling Shroud – CS | Crucibles – CRU |
Power Supplies
Components for molecular beam epitaxy effusion cells
| Standard Effusion Cell – WEZ | Organic Material Effusion Cell – OME |
|---|---|
| Mini Effusion Cell – MEZ | High Temperature Effusion Cell – HTEZ |
| Production Effusion Cell – PEZ | High Temperature Source – HTS |
| Low Temperature Effusion Cell – NTEZ | Oxygen Resistant Effusion Cell – OREZ |
Valved Sources
| Valved GaP Compound Source – VGCS | Valved Arsenic Cracker Source – VACS |
Electron Beam Evaporators
| Standard E-Beam Evaporator – EBV | Vertical E-Beam Evaporator – EBVV |
|---|---|
| Multi-Pocket E-Beam Evaporator – EBVM | HV Power Supplies for EBV Series |
Dopant Sources
| Silicon Sublimation Source – SUSI | Dual Dopant Source – DCS |
|---|---|
| Carbon Sublimation Source – SUKO |
Dopant Source Sources
| Gallium Phosphide Cubes – 6N Pure | Monocrystalline Silicon – >1000 Ohm/cm |
|---|---|
| Single Crystal, 0.5g | Shaped to fit customer’s crucibles, 2cc – 500cc |
Gas Sources
| Hydrogen Atom Beam Source – HABS | Gas Cracker Cell – GRZ |
|---|---|
| Hydrogen Cracker Source – HCS | Thermal Gas Injector – TGI |
MBE / UHV Systems
| Research MBE Systems | In-Situ Etching Systems – ISES |
Equipment
| Substrate Manipulator – SH | Cross Beam Ionizer – CBI |
|---|---|
| Power Supply, Temperature Control – PS | Shutter Control Unit – SCU |
| Thermocouples – TC | Shutter – S |
| Cables and Connectors – CA | Sof Acting Rotary Shutter Module – RSM |
| Manipulator Control Unit – MCU | Soft Acting Linear Shutter Module – LSM |
| Cryopump Valve Control Unit – CVCU | Magnetic Rotary Feedthrough – MRD |
| Beam Flux Monitor – BFM | Viewport Shutter – FSH |
| Cooling Shroud – CS | Crucibles – CRU |
Substrate Manipulators
Components for molecular beam epitaxy effusion cells
| Standard Effusion Cell – WEZ | Organic Material Effusion Cell – OME |
|---|---|
| Mini Effusion Cell – MEZ | High Temperature Effusion Cell – HTEZ |
| Production Effusion Cell – PEZ | High Temperature Source – HTS |
| Low Temperature Effusion Cell – NTEZ | Oxygen Resistant Effusion Cell – OREZ |
Valved Sources
| Valved GaP Compound Source – VGCS | Valved Arsenic Cracker Source – VACS |
Electron Beam Evaporators
| Standard E-Beam Evaporator – EBV | Vertical E-Beam Evaporator – EBVV |
|---|---|
| Multi-Pocket E-Beam Evaporator – EBVM | HV Power Supplies for EBV Series |
Dopant Sources
| Silicon Sublimation Source – SUSI | Dual Dopant Source – DCS |
|---|---|
| Carbon Sublimation Source – SUKO |
Dopant Source Sources
| Gallium Phosphide Cubes – 6N Pure | Monocrystalline Silicon – >1000 Ohm/cm |
|---|---|
| Single Crystal, 0.5g | Shaped to fit customer’s crucibles, 2cc – 500cc |
Gas Sources
| Hydrogen Atom Beam Source – HABS | Gas Cracker Cell – GRZ |
|---|---|
| Hydrogen Cracker Source – HCS | Thermal Gas Injector – TGI |
MBE / UHV Systems
| Research MBE Systems | In-Situ Etching Systems – ISES |
Equipment
| Substrate Manipulator – SH | Cross Beam Ionizer – CBI |
|---|---|
| Power Supply, Temperature Control – PS | Shutter Control Unit – SCU |
| Thermocouples – TC | Shutter – S |
| Cables and Connectors – CA | Sof Acting Rotary Shutter Module – RSM |
| Manipulator Control Unit – MCU | Soft Acting Linear Shutter Module – LSM |
| Cryopump Valve Control Unit – CVCU | Magnetic Rotary Feedthrough – MRD |
| Beam Flux Monitor – BFM | Viewport Shutter – FSH |
| Cooling Shroud – CS | Crucibles – CRU |
Headquarters
UMC Corporate Headquarters located at 160 Chubb Ave. Suite 206, Lyndhurst, NJ 07071
